Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Jaekul Lee; Hyunjung Shin; Sungdong Kim; Seungbum Hong; Juhwan Chung; Hongsik Park; Jooho Moon

doi:10.1143/jjap.42.l1171

Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

Jaekul Lee, Hyunjung Shin, Sungdong Kim, Seungbum Hong, Juhwan Chung, Hongsik Park, Jooho Moon

School of Electronics Engineering

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

Original language	English
Pages (from-to)	L1171-L1174
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	42
Issue number	10 A
DOIs	https://doi.org/10.1143/jjap.42.l1171
State	Published - 1 Oct 2003

Keywords

AFM
Cantilever
SAMs
Spring constant
SU-8

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10.1143/jjap.42.l1171

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abstract = "Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.",

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AU - Lee, Jaekul

AU - Shin, Hyunjung

AU - Kim, Sungdong

AU - Hong, Seungbum

AU - Chung, Juhwan

AU - Park, Hongsik

AU - Moon, Jooho

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N2 - Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

AB - Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature ∼80nm) had a resonant frequency of 44kHz, which yields a spring constant of 0.248 N/m.

KW - AFM

KW - Cantilever

KW - SAMs

KW - Spring constant

KW - SU-8

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JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

IS - 10 A

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Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

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