Fabrication of Nanometer Scale Structure Using Thin Film Stress

Dong Il Park; Sung Ho Hahm; Jong Hyun Lee; Jung Hee Lee

doi:10.1109/IMNC.1998.730021

Fabrication of Nanometer Scale Structure Using Thin Film Stress

Dong Il Park, Sung Ho Hahm, Jong Hyun Lee, Jung Hee Lee

School of Electronics Engineering

Kyungpook National University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication	1998 International Microprocesses and Nanotechnology Conference
Editors	Hyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	156-157
Number of pages	2
ISBN (Electronic)	4930813832, 9784930813831
DOIs	https://doi.org/10.1109/IMNC.1998.730021
State	Published - 1998
Event	1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of Duration: 13 Jul 1998 → 16 Jul 1998

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
Volume	1998-July

Conference

Conference	1998 International Microprocesses and Nanotechnology Conference, MNC 1998
Country/Territory	Korea, Republic of
City	Kyoungju
Period	13/07/98 → 16/07/98

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10.1109/IMNC.1998.730021

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Park, D. I., Hahm, S. H., Lee, J. H., & Lee, J. H. (1998). Fabrication of Nanometer Scale Structure Using Thin Film Stress. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 156-157). Article 730021 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.730021

Park, Dong Il ; Hahm, Sung Ho ; Lee, Jong Hyun et al. / Fabrication of Nanometer Scale Structure Using Thin Film Stress. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 156-157 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).

@inproceedings{7828c6ac85e748e09f625c095996c135,

title = "Fabrication of Nanometer Scale Structure Using Thin Film Stress",

author = "Park, {Dong Il} and Hahm, {Sung Ho} and Lee, {Jong Hyun} and Lee, {Jung Hee}",

year = "1998",

doi = "10.1109/IMNC.1998.730021",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "156--157",

editor = "Yoo, {Hyung Joon} and Shinji Okazaki and Jinho Ahn and Ohyun Kim and Masanori Komuro",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 1998",

address = "United States",

note = "1998 International Microprocesses and Nanotechnology Conference, MNC 1998 ; Conference date: 13-07-1998 Through 16-07-1998",

}

Park, DI, Hahm, SH, Lee, JH & Lee, JH 1998, Fabrication of Nanometer Scale Structure Using Thin Film Stress. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 730021, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 156-157, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 13/07/98. https://doi.org/10.1109/IMNC.1998.730021

Fabrication of Nanometer Scale Structure Using Thin Film Stress. / Park, Dong Il; Hahm, Sung Ho; Lee, Jong Hyun et al.
Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 156-157 730021 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication of Nanometer Scale Structure Using Thin Film Stress

AU - Park, Dong Il

AU - Hahm, Sung Ho

AU - Lee, Jong Hyun

AU - Lee, Jung Hee

PY - 1998

Y1 - 1998

UR - http://www.scopus.com/inward/record.url?scp=85051508765&partnerID=8YFLogxK

U2 - 10.1109/IMNC.1998.730021

DO - 10.1109/IMNC.1998.730021

M3 - Conference contribution

AN - SCOPUS:85051508765

T3 - Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference

SP - 156

EP - 157

BT - Digest of Papers - Microprocesses and Nanotechnology 1998

A2 - Yoo, Hyung Joon

A2 - Okazaki, Shinji

A2 - Ahn, Jinho

A2 - Kim, Ohyun

A2 - Komuro, Masanori

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 1998 International Microprocesses and Nanotechnology Conference, MNC 1998

Y2 - 13 July 1998 through 16 July 1998

ER -

Park DI, Hahm SH, Lee JH, Lee JH. Fabrication of Nanometer Scale Structure Using Thin Film Stress. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 156-157. 730021. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). doi: 10.1109/IMNC.1998.730021

Fabrication of Nanometer Scale Structure Using Thin Film Stress

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