@inproceedings{7db1e774c465483fba1eb68d61f6a4ea,
title = "Fabrication of nanostencil using size reduction of micro-aperture by additional deposition",
abstract = "We demonstrated a low-cost method for nanostencil fabrication. Microstencils with 1-2 μm-large patterns were made by standard MEMS processes. The size of micro-apertures in the stencil could be reduced down to sub-micro-meter scale by additional deposition. The suggested technique is useful for the nanostencil fabrication with low manufacturing cost and high throughput.",
author = "Lee, {J. S.} and Park, {W. B.} and Park, {C. W.} and Kim, {G. M.}",
year = "2007",
doi = "10.1109/IMNC.2007.4456168",
language = "English",
isbn = "4990247248",
series = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",
pages = "190--191",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",
note = "s20th International Microprocesses and Nanotechnology Conference, MNC 2007 ; Conference date: 05-11-2007 Through 08-11-2007",
}