Abstract
A selective wet-etching method for micro-fabricating As2S 3 glass ridge waveguides, using CS2 solution with iodine as an oxidising reactant, has been developed. The proposed method is based on photo-induced changes in chalcogenide glasses, and therefore can be free of photomasks and photoresists. The optical properties of such etched ridge waveguides have been tested and they exhibit a more than 2dB/cm loss reduction compared to laser direct-written channel waveguides.
Original language | English |
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Pages (from-to) | 472-474 |
Number of pages | 3 |
Journal | Electronics Letters |
Volume | 44 |
Issue number | 7 |
DOIs | |
State | Published - 2008 |