Ferroelectrically gated atomically thin transition-metal dichalcogenides as nonvolatile memory

Changhyun Ko, Yeonbae Lee, Yabin Chen, Joonki Suh, Deyi Fu, Aslihan Suslu, Sangwook Lee, James David Clarkson, Hwan Sung Choe, Sefaatin Tongay, Ramamoorthy Ramesh, Junqiao Wu

Research output: Contribution to journalArticlepeer-review

150 Scopus citations

Abstract

Ferroelectrically driven nonvolatile memory is demonstrated by interfacing 2D semiconductors and ferroelectric thin films, exhibiting superior memory performance comparable to existing thin-film ferroelectric field-effect transistors. An optical memory effect is also observed with large modulation of photoluminescence tuned by the ferroelectric gating, potentially finding applications in optoelectronics and valleytronics.

Original languageEnglish
Pages (from-to)2923-2930
Number of pages8
JournalAdvanced Materials
Volume28
Issue number15
DOIs
StatePublished - 20 Apr 2016

Keywords

  • 2D materials
  • ferroelectrics
  • field-effect transistors
  • nonvolatile memory
  • transition-metal dichalcogenides

Fingerprint

Dive into the research topics of 'Ferroelectrically gated atomically thin transition-metal dichalcogenides as nonvolatile memory'. Together they form a unique fingerprint.

Cite this