Geometric interpretation of the increase in the number of photons using ultra-thin films

Until now, surface treatment methods have been subject to many restrictions because each material has different properties. In addition, the effect of surface treatment has been approached qualitatively rather than quantitatively. This study demonstrates the remarkable improvement in the optical intensity of a matrix upon depositing an ultra-thin film layer, regardless of the morphology, dimension, type, and size. Thus, a new optical energy amplification mechanism, in which the number of photons can be increased, is proposed using a geometrical approach. In particular, the flame chemical vapour deposition used here was achieved within seconds. Moreover, based on the purpose of the process, the reduction of the metal oxide and the deposition of the amorphous carbon could be easily controlled. The powerful optical results were investigated for various material surfaces such as Au-SnO2 nanowires, porous Si substrates, and Al2O3 substrates.