High-performance logic transistor DC benchmarking toward 7 nm technology-node between III-V and Si tri-gate n-MOSFETs using virtual-source injection velocity model

Jin Su Kim, Rock Hyun Baek, Do Kywn Kim, Taewoo Kim, Dae Hyun Kim

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Injection velocity (vinj) is a unique figure-of-merit that determines logic transistor ON-current (ION) and switching delay (CV/I). This paper reports on Virtual-Source (VS) based analytical and physical model, which was calibrated by using state-of-the-art experimental data on III-V and Si tri-gate n-MOSFET, aiming to compare High-Performance (HP) logic transistor performance at 7 nm technology-node. We find that a significant increase in the virtual source injection velocity and improvement in the electrostatic integrity are critical, to meet the projected ION/IOFF ratio for the 7 nm technology node.

Original languageEnglish
Pages (from-to)100-103
Number of pages4
JournalSolid-State Electronics
Volume116
DOIs
StatePublished - Feb 2016

Keywords

  • InGaAs
  • Injection velocity
  • ITRS
  • Logic
  • Virtual-Source

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