High Performance Sol-gel Processed SnO2 thin film transistor with sol-gel processed ZrO2 layers

Won Yong Lee, Bongho Jang, Sojeong Lee, Taegyun Kim, Jaewon Jang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

We propose an effective process for the enhancement of electrical performance in solution-processed SnO2-based oxide thin-film transistors (TFTs) by adding a ZrO2layer on the active layer. The ZrO2layer was spin coated on the SnO2film with a single coating and double coating process under the same condition. The SnO2 TFTs with double-coated ZrO2 layers showed a saturation mobility of 51.2 cm2/Vs, which was more than four times higher than that of conventional SnO2 TFTs. Furthermore, the subthreshold slope reduced from 1.17 V /decade to 0.36 V /decade for SnO2 TFTs with double-coated ZrO2 layers. These results are attributed to the electron transfer based on the theory of electron donation from high-k dielectrics to oxide semiconductors.

Original languageEnglish
Title of host publicationAM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices
Subtitle of host publicationTFT Technologies and FPD Materials, Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Print)9784990875350
DOIs
StatePublished - 15 Aug 2018
Event25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 - Kyoto, Japan
Duration: 3 Jul 20186 Jul 2018

Publication series

NameAM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, Proceedings

Conference

Conference25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018
Country/TerritoryJapan
CityKyoto
Period3/07/186/07/18

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