Importance of the inherent and the relative surface energies in generating patterned layer in a solution process

We report the importance of the inherent and the relative surface energies in generating a patterned organic semiconductor layer through a solution process. The inherent and the relative surface energies of the substrate can be effectively controlled using polydimethylsiloxane in combination with an UV/ozone treatment. The controlled inherent surface energy in each region, as well as the high-order difference of relative surface energy, plays a significant role in generating the patterned layer. In addition, the patterned metal-semiconductor-metal (MSM) structure shows a lower lateral current than the non-patterned MSM structure because the current path is limited.