Improvement of MgO characteristics using RF-plasma treatment in AC plasma display panel

Choon Sang Park; Heung Sik Tae

doi:10.1080/15421406.2010.499331

Improvement of MgO characteristics using RF-plasma treatment in AC plasma display panel

Choon Sang Park, Heung Sik Tae

School of Electronics Engineering

Kyungpook National University

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

The characteristics of the MgO layer are known to be an important parameter that affects the discharge characteristics in an ac-PDP. In this paper, to improve the MgO characteristics of 50-in. full-HD ac-PDP with He (35%) - Xe (11%) contents, RF-plasma treatments on the MgO layer are examined under various gases for plasma treatment. The resultant changes in the MgO characteristics, including the morphology, roughness, secondary electron coefficient, and firing voltage, were examined in comparison with both cases with and without plasma treatment on the MgO layer. It is concluded that the Ar and Ar>O₂ plasma treatments can enhance the MgO characteristics, such as the roughness, secondary electron coefficient, and firing voltage.

Original language	English
Pages (from-to)	73/[373]-81/[381]
Journal	Molecular Crystals and Liquid Crystals
Volume	531
DOIs	https://doi.org/10.1080/15421406.2010.499331
State	Published - 11 Oct 2010

Keywords

50-in. full-HD AC-PDP module
AFM
firing voltage
MgO
morphology
plasma treatment
roughness
secondary electron coefficient
SEM
Vt closed curve

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10.1080/15421406.2010.499331

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@article{2dcfce16d6094c31b40dc5a1e58ecced,

title = "Improvement of MgO characteristics using RF-plasma treatment in AC plasma display panel",

abstract = "The characteristics of the MgO layer are known to be an important parameter that affects the discharge characteristics in an ac-PDP. In this paper, to improve the MgO characteristics of 50-in. full-HD ac-PDP with He (35%) - Xe (11%) contents, RF-plasma treatments on the MgO layer are examined under various gases for plasma treatment. The resultant changes in the MgO characteristics, including the morphology, roughness, secondary electron coefficient, and firing voltage, were examined in comparison with both cases with and without plasma treatment on the MgO layer. It is concluded that the Ar and Ar>O2 plasma treatments can enhance the MgO characteristics, such as the roughness, secondary electron coefficient, and firing voltage.",

keywords = "50-in. full-HD AC-PDP module, AFM, firing voltage, MgO, morphology, plasma treatment, roughness, secondary electron coefficient, SEM, Vt closed curve",

author = "Park, {Choon Sang} and Tae, {Heung Sik}",

year = "2010",

month = oct,

day = "11",

doi = "10.1080/15421406.2010.499331",

language = "English",

volume = "531",

pages = "73/[373]--81/[381]",

journal = "Molecular Crystals and Liquid Crystals",

issn = "1542-1406",

publisher = "Taylor and Francis Ltd.",

}

TY - JOUR

T1 - Improvement of MgO characteristics using RF-plasma treatment in AC plasma display panel

AU - Park, Choon Sang

AU - Tae, Heung Sik

PY - 2010/10/11

Y1 - 2010/10/11

N2 - The characteristics of the MgO layer are known to be an important parameter that affects the discharge characteristics in an ac-PDP. In this paper, to improve the MgO characteristics of 50-in. full-HD ac-PDP with He (35%) - Xe (11%) contents, RF-plasma treatments on the MgO layer are examined under various gases for plasma treatment. The resultant changes in the MgO characteristics, including the morphology, roughness, secondary electron coefficient, and firing voltage, were examined in comparison with both cases with and without plasma treatment on the MgO layer. It is concluded that the Ar and Ar>O2 plasma treatments can enhance the MgO characteristics, such as the roughness, secondary electron coefficient, and firing voltage.

AB - The characteristics of the MgO layer are known to be an important parameter that affects the discharge characteristics in an ac-PDP. In this paper, to improve the MgO characteristics of 50-in. full-HD ac-PDP with He (35%) - Xe (11%) contents, RF-plasma treatments on the MgO layer are examined under various gases for plasma treatment. The resultant changes in the MgO characteristics, including the morphology, roughness, secondary electron coefficient, and firing voltage, were examined in comparison with both cases with and without plasma treatment on the MgO layer. It is concluded that the Ar and Ar>O2 plasma treatments can enhance the MgO characteristics, such as the roughness, secondary electron coefficient, and firing voltage.

KW - 50-in. full-HD AC-PDP module

KW - AFM

KW - firing voltage

KW - MgO

KW - morphology

KW - plasma treatment

KW - roughness

KW - secondary electron coefficient

KW - SEM

KW - Vt closed curve

UR - http://www.scopus.com/inward/record.url?scp=78649294531&partnerID=8YFLogxK

U2 - 10.1080/15421406.2010.499331

DO - 10.1080/15421406.2010.499331

M3 - Article

AN - SCOPUS:78649294531

SN - 1542-1406

VL - 531

SP - 73/[373]-81/[381]

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

ER -

Improvement of MgO characteristics using RF-plasma treatment in AC plasma display panel

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Keywords

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