Inorganic polymer photoresist for direct ceramic patterning by photolithography

Tuan Anh Pham; Pilnam Kim; Moonkyoo Kwak; Kahp Y. Suh; Dong Pyo Kim

doi:10.1039/b708480c

Inorganic polymer photoresist for direct ceramic patterning by photolithography

Tuan Anh Pham
, Pilnam Kim
, Moonkyoo Kwak
, Kahp Y. Suh
, Dong Pyo Kim

School of Mechanical Engineering

Chungnam National University
Seoul National University

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800°C.

Original language	English
Pages (from-to)	4021-4023
Number of pages	3
Journal	Chemical Communications
Issue number	39
DOIs	https://doi.org/10.1039/b708480c
State	Published - 2007

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@article{78a285cbb030443781163a73cd08d48a,

title = "Inorganic polymer photoresist for direct ceramic patterning by photolithography",

abstract = "A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800°C.",

author = "Pham, \{Tuan Anh\} and Pilnam Kim and Moonkyoo Kwak and Suh, \{Kahp Y.\} and Kim, \{Dong Pyo\}",

year = "2007",

doi = "10.1039/b708480c",

language = "English",

pages = "4021--4023",

journal = "Chemical Communications",

issn = "1359-7345",

publisher = "Royal Society of Chemistry",

number = "39",

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TY - JOUR

T1 - Inorganic polymer photoresist for direct ceramic patterning by photolithography

AU - Pham, Tuan Anh

AU - Kim, Pilnam

AU - Kwak, Moonkyoo

AU - Suh, Kahp Y.

AU - Kim, Dong Pyo

PY - 2007

Y1 - 2007

N2 - A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800°C.

AB - A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800°C.

UR - https://www.scopus.com/pages/publications/34948853244

U2 - 10.1039/b708480c

DO - 10.1039/b708480c

M3 - Article

AN - SCOPUS:34948853244

SN - 1359-7345

SP - 4021

EP - 4023

JO - Chemical Communications

JF - Chemical Communications

IS - 39

ER -

Inorganic polymer photoresist for direct ceramic patterning by photolithography

Abstract

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