Integrated silicon microspectrometers

Seong Ho Kong; José Higino Correia; Ger de Graaf; Marian Bartek; Reinoud F. Wolffenbuttel

doi:10.1109/5289.953457

Integrated silicon microspectrometers

Seong Ho Kong, José Higino Correia, Ger de Graaf, Marian Bartek, Reinoud F. Wolffenbuttel

School of Electronics Engineering

Research output: Contribution to journal › Article › peer-review

28 Scopus citations

Abstract

Microspectrometers have been fabricated using standard microelectronic processing, with additional compatible post-processing steps, for either a grating or a Fabry-Perot resonator which is used as dispersion element. The spectral resolution ranges between 20 and 50 channels in the selected operating range. Combining a standard microelectronic process with additional microelectromechanical systems (MEMS) processing for optical components results in small and low-cost solutions for many industrial and consumer applications.

Original language	English
Pages (from-to)	34-38
Number of pages	5
Journal	IEEE Instrumentation and Measurement Magazine
Volume	4
Issue number	3
DOIs	https://doi.org/10.1109/5289.953457
State	Published - Sep 2001

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AU - de Graaf, Ger

AU - Bartek, Marian

AU - Wolffenbuttel, Reinoud F.

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Integrated silicon microspectrometers

Abstract

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