TY - JOUR
T1 - Luminescence of pulsed-laser-deposited SrAl2O4:Eu,Dy thin film and its role as a stress indicator
AU - Sohn, Kee Sun
AU - Park, Duk Hyun
AU - Kim, Ji Sik
PY - 2005
Y1 - 2005
N2 - The ultimate goal of the present investigation was to develop an SrAl 2O4:Eu,Dy thin-film phosphor on the surface of mechanical test specimens to act as a stress or crack indicator during testing. As a preliminary step, SrAl2O4:Eu,Dy thin-film phosphors were deposited on several conventional substrates such as quartz glass, Si(111), Si(001), and corrugated quartz glass using a pulsed laser deposition (PLD) technique. Processing parameters were optimized, in an attempt to enhance the efficiency of luminescence of the SrAl2O4:Eu,Dy thin-film phosphor. The optimal PLD processing conditions for the SrAl2O 4:Eu,Dy thin-film phosphor were different from that for other conventional oxide thin-film phosphors in that an oxygen supply during the PLD process was not necessary, a postdeposition annealing in an oxidizing atmosphere was ineffective, and the corrugated substrate did not have a significantly enhanced extraction efficiency. By adopting the best PLD processing conditions, based on the preliminary depositions on conventional substrates, the SrAl 2O4:Eu,Dy thin-film phosphor was deposited on the surface of a compact tension specimen composed of polycrystalline A12O 3 and the applicability of the SrAl2O4:Eu,Dy thin-film phosphor as a stress or crack indicator was verified in an actual mechanical test.
AB - The ultimate goal of the present investigation was to develop an SrAl 2O4:Eu,Dy thin-film phosphor on the surface of mechanical test specimens to act as a stress or crack indicator during testing. As a preliminary step, SrAl2O4:Eu,Dy thin-film phosphors were deposited on several conventional substrates such as quartz glass, Si(111), Si(001), and corrugated quartz glass using a pulsed laser deposition (PLD) technique. Processing parameters were optimized, in an attempt to enhance the efficiency of luminescence of the SrAl2O4:Eu,Dy thin-film phosphor. The optimal PLD processing conditions for the SrAl2O 4:Eu,Dy thin-film phosphor were different from that for other conventional oxide thin-film phosphors in that an oxygen supply during the PLD process was not necessary, a postdeposition annealing in an oxidizing atmosphere was ineffective, and the corrugated substrate did not have a significantly enhanced extraction efficiency. By adopting the best PLD processing conditions, based on the preliminary depositions on conventional substrates, the SrAl 2O4:Eu,Dy thin-film phosphor was deposited on the surface of a compact tension specimen composed of polycrystalline A12O 3 and the applicability of the SrAl2O4:Eu,Dy thin-film phosphor as a stress or crack indicator was verified in an actual mechanical test.
UR - http://www.scopus.com/inward/record.url?scp=27644496722&partnerID=8YFLogxK
U2 - 10.1149/1.2012947
DO - 10.1149/1.2012947
M3 - Article
AN - SCOPUS:27644496722
SN - 0013-4651
VL - 152
SP - H161-H167
JO - Journal of the Electrochemical Society
JF - Journal of the Electrochemical Society
IS - 10
ER -