Magnetic and transport properties of Ti 0.96Co xNi 0.04-xO 2-δ thin films

J. H. Cho, T. J. Hwang, D. H. Kim, Y. G. Joh, E. C. Kim, Dong Ho Kim, W. S. Yoon, H. C. Ri

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Abstract

We investigated the magnetic and transport properties of Co and Ni co-doped TiO 2 thin films grown by using a sol-gel method with Co and Ni concentrations from 0 % to 4 %. All the samples exhibited ferromagnetism at room temperature, but were highly resistive when annealed in vacuum at 650°C. The magnetic moment per ion increased with the Co concentration. After annealing at 850°C, the electrical conductance and the magnetic moment per ion of the films were enhanced, but a small Co metallic peak was observed in the X-ray diffraction pattern. The Hall effect study showed that the carriers were electrons with densities lower than 10 19 cm -3 at room temperature for the samples annealed at 850°C. A weak anomalous Hall effect was observed and increased with the Co concentration. We discuss the co-doping effect by comparing the results with those of films singly doped with Ni or Co.

Original languageEnglish
Pages (from-to)1400-1404
Number of pages5
JournalJournal of the Korean Physical Society
Volume48
Issue number6
StatePublished - Jun 2006

Keywords

  • Co and Ni co-doped TiO thin film
  • Diluted magnetic semiconductor

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