Metal-oxide semiconductor field-effect transistors using single ZnO nanowire

Young Woo Heo, B. S. Kang, L. C. Tien, Y. Kwon, J. R. La Roche, B. P. Gila, F. Ren, S. J. Pearton, D. P. Norton

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1 Scopus citations

Abstract

Single ZnO nanowire metal-oxide semiconductor field effect transistors (MOSFETs) were fabricated using nanowires grown by site selective Molecular Beam Epitaxy. When measured in the dark at 25°C,the depletion-mode transistors exhibit good saturation behavior, a threshold voltage of ∼3V and a maximum transconductance of order 0.3 mS/mm .Under ultra-violet (366nm) illumination, the drain-source current increase by approximately a factor of 5 and the maximum transconductance is ∼ 5 mS/mm. The channel mobility is estimated to be ∼3 cm 2/V.s, which is comparable to that reported for thin film ZnO enhancement mode MOSFETs and the on/off ratio was ∼25 in the dark and ∼125 under UV illumination.

Original languageEnglish
Article numberB8.1
Pages (from-to)327-332
Number of pages6
JournalMaterials Research Society Symposium Proceedings
Volume829
StatePublished - 2005
EventProgress in Compound Semiconductor Materials IV - Electronic and Optoelectronic Applications - Boston, MA, United States
Duration: 29 Nov 20043 Dec 2004

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