Methacrylate homo- and copolymers containing photosensitive abietate group: Their high thermal stability, unique photocrosslinking behavior, transparency, and photolithographic application

Giseop Kwak, Jae Ung Choi, Kwan Ho Seo, Lee Soon Park, Seok Hee Hyun, Woo Sik Kim

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

The monomer methacryloyloxyethyl abietate (2) was synthesized by a simple two-step reaction starting from abietic acid. The homopolymerization of 2 and its copolymerization with MMA using AIBN as an initiator provided high-molecular-weight polymers 3-6 (10 × 103 < Mn < 70 × 103) in high yields. These polymers were well-dissolved in organic solvents. The glass-transition temperatures, T g, of all polymers were higher than 130°C, much higher than that of PMMA. No melting points, Tm, were observed. Their decomposition temperatures were very high, as T5 wt % loss > 300°C. These results indicate that these polymers are thermally stable and glassy at room temperature. The absorption bands due to the conjugated carbon-carbon double bonds within the abietate group significantly decreased with an increase in the exposure doses. Normalized absorbance as a function of UV exposure doses nonlinearly changed because of the occurrence of a certain threshold at 1.0 J/cm2 in all polymers. Solvent extraction experiment revealed that interchain crosslinking effectively occurred even in copolymers with relatively low amounts of the abietate group. The polymer films showed a clear transparency of more than 90%. Photolithography of the polymer films provided high-resolution pattern images.

Original languageEnglish
Pages (from-to)2898-2902
Number of pages5
JournalChemistry of Materials
Volume19
Issue number11
DOIs
StatePublished - 29 May 2007

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