Methacrylate homo- and copolymers containing photosensitive abietate group: Their high thermal stability, unique photocrosslinking behavior, transparency, and photolithographic application
- Giseop Kwak
- , Jae Ung Choi
- , Kwan Ho Seo
- , Lee Soon Park
- , Seok Hee Hyun
- , Woo Sik Kim
- Kyungpook National University
Research output: Contribution to journal › Article › peer-review
8
Scopus
citations