Methacrylate homo- and copolymers containing photosensitive abietate group: Their high thermal stability, unique photocrosslinking behavior, transparency, and photolithographic application

Giseop Kwak, Jae Ung Choi, Kwan Ho Seo, Lee Soon Park, Seok Hee Hyun, Woo Sik Kim

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

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