Molecular dynamic simulation of AFM-based nano lithography process for fabrication of MEMS components

Y. S. Kim; S. H. Yang; C. I. Kim; S. S. Lea

doi:10.4028/www.scientific.net/msf.426-432.2243

Molecular dynamic simulation of AFM-based nano lithography process for fabrication of MEMS components

Y. S. Kim, S. H. Yang, C. I. Kim, S. S. Lea

School of Mechanical Engineering

Research output: Contribution to journal › Conference article › peer-review

7 Scopus citations

Abstract

The atomic force microscopy (AFM)-based nano lithographic technique is currently used to directly machine material surfaces and fabricate nano components for MEMS (micro electro mechanical system). As such, three-dimensional molecular dynamic computer simulations were conducted to evaluate the characteristics of the nano lithography process. The 3-dimensional molecular dynamic (MD) simulations were carried out on monocrystalline copper by varying specific combinations of the crystal orientation and cutting(plowing) direction to investigate their effect on the nature of the deformation.

Original language	English
Pages (from-to)	2243-2248
Number of pages	6
Journal	Materials Science Forum
Volume	426-432
Issue number	3
DOIs	https://doi.org/10.4028/www.scientific.net/msf.426-432.2243
State	Published - 2003
Event	Thermec 2003 Processing and Manufacturing of Advanced Materials - Madrid, Spain Duration: 7 Jul 2003 → 11 Jul 2003

Keywords

AFM
MEMS
Molecular Dynamics Simulation
Morse Potential
Nano-Lithography

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title = "Molecular dynamic simulation of AFM-based nano lithography process for fabrication of MEMS components",

abstract = "The atomic force microscopy (AFM)-based nano lithographic technique is currently used to directly machine material surfaces and fabricate nano components for MEMS (micro electro mechanical system). As such, three-dimensional molecular dynamic computer simulations were conducted to evaluate the characteristics of the nano lithography process. The 3-dimensional molecular dynamic (MD) simulations were carried out on monocrystalline copper by varying specific combinations of the crystal orientation and cutting(plowing) direction to investigate their effect on the nature of the deformation.",

keywords = "AFM, MEMS, Molecular Dynamics Simulation, Morse Potential, Nano-Lithography",

author = "Kim, {Y. S.} and Yang, {S. H.} and Kim, {C. I.} and Lea, {S. S.}",

year = "2003",

doi = "10.4028/www.scientific.net/msf.426-432.2243",

language = "English",

volume = "426-432",

pages = "2243--2248",

journal = "Materials Science Forum",

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number = "3",

note = "Thermec 2003 Processing and Manufacturing of Advanced Materials ; Conference date: 07-07-2003 Through 11-07-2003",

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TY - JOUR

T1 - Molecular dynamic simulation of AFM-based nano lithography process for fabrication of MEMS components

AU - Kim, Y. S.

AU - Yang, S. H.

AU - Kim, C. I.

AU - Lea, S. S.

PY - 2003

Y1 - 2003

N2 - The atomic force microscopy (AFM)-based nano lithographic technique is currently used to directly machine material surfaces and fabricate nano components for MEMS (micro electro mechanical system). As such, three-dimensional molecular dynamic computer simulations were conducted to evaluate the characteristics of the nano lithography process. The 3-dimensional molecular dynamic (MD) simulations were carried out on monocrystalline copper by varying specific combinations of the crystal orientation and cutting(plowing) direction to investigate their effect on the nature of the deformation.

AB - The atomic force microscopy (AFM)-based nano lithographic technique is currently used to directly machine material surfaces and fabricate nano components for MEMS (micro electro mechanical system). As such, three-dimensional molecular dynamic computer simulations were conducted to evaluate the characteristics of the nano lithography process. The 3-dimensional molecular dynamic (MD) simulations were carried out on monocrystalline copper by varying specific combinations of the crystal orientation and cutting(plowing) direction to investigate their effect on the nature of the deformation.

KW - AFM

KW - MEMS

KW - Molecular Dynamics Simulation

KW - Morse Potential

KW - Nano-Lithography

UR - http://www.scopus.com/inward/record.url?scp=0037663315&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/msf.426-432.2243

DO - 10.4028/www.scientific.net/msf.426-432.2243

M3 - Conference article

AN - SCOPUS:0037663315

SN - 0255-5476

VL - 426-432

SP - 2243

EP - 2248

JO - Materials Science Forum

JF - Materials Science Forum

IS - 3

T2 - Thermec 2003 Processing and Manufacturing of Advanced Materials

Y2 - 7 July 2003 through 11 July 2003

ER -

Molecular dynamic simulation of AFM-based nano lithography process for fabrication of MEMS components

Abstract

Keywords

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