Abstract
A digital, direct nanoscale metal patterning method is developed using femtosecond laser digital processing of metal nanoparticles for nanoscale electronics fabrication without using conventional vacuum deposition or a photolithography mask. This method is expected to be a potential alternative to the conventional electron beam lithography method for arbitrary nanoscale direct patterning in single-step, low-temperature, and non-vacuum environments.
| Original language | English |
|---|---|
| Pages (from-to) | 3176-3181 |
| Number of pages | 6 |
| Journal | Advanced Materials |
| Volume | 23 |
| Issue number | 28 |
| DOIs | |
| State | Published - 26 Jul 2011 |
Keywords
- femtosecond laser processing
- maskless nanopatterning
- metal deposition
- metal patterning
- organic field-effect transistors
- silver nanocrystals