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Nanoscale electronics: Digital fabrication by direct femtosecond laser processing of metal nanoparticles

  • Yong Son
  • , Junyeob Yeo
  • , Hanul Moon
  • , Tae Woo Lim
  • , Sukjoon Hong
  • , Koo Hyun Nam
  • , Seunghyup Yoo
  • , Costas P. Grigoropoulos
  • , Dong Yol Yang
  • , Seung Hwan Ko
  • Korea Advanced Institute of Science and Technology
  • Ewha Womans University
  • University of California at Berkeley

Research output: Contribution to journalArticlepeer-review

197 Scopus citations

Abstract

A digital, direct nanoscale metal patterning method is developed using femtosecond laser digital processing of metal nanoparticles for nanoscale electronics fabrication without using conventional vacuum deposition or a photolithography mask. This method is expected to be a potential alternative to the conventional electron beam lithography method for arbitrary nanoscale direct patterning in single-step, low-temperature, and non-vacuum environments.

Original languageEnglish
Pages (from-to)3176-3181
Number of pages6
JournalAdvanced Materials
Volume23
Issue number28
DOIs
StatePublished - 26 Jul 2011

Keywords

  • femtosecond laser processing
  • maskless nanopatterning
  • metal deposition
  • metal patterning
  • organic field-effect transistors
  • silver nanocrystals

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