Abstract
In this study, a highly crystalline SnO2 thin film was formed using a sol–gel process. In addition, a SnO2 thin-film transistor was successfully fabricated. The fabricated SnO2 thin-film transistor exhibited conventional n-type semiconductor properties, with a mobility of 0.1 cm2 V-1 s-1, an on/off current ratio of 1.2 × 105, and a subthreshold swing of 2.69. The formed SnO2 had a larger bandgap (3.95 eV) owing to the bandgap broadening effect. The fabricated photosensor exhibited a responsivity of 1.4 × 10-6 Jones, gain of 1.43 × 107, detectivity of 2.75 × 10-6 cm Hz1/2 W−1, and photosensitivity of 4.67 × 102.
| Original language | English |
|---|---|
| Pages (from-to) | 328-331 |
| Number of pages | 4 |
| Journal | Journal of Sensor Science and Technology |
| Volume | 29 |
| Issue number | 5 |
| DOIs | |
| State | Published - Sep 2020 |
Keywords
- Photo sensor
- SnO
- Sol-gel
- Thin film transistor
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