Abstract
The oxidation behavior of Nb-Si-B alloys with NbSi2 coating layers was investigated at 1100 C under ambient atmosphere. Continuous NbSi 2 layers with a thickness of 40-60 μm were coated by depositing Si on the alloy surfaces at 900 C using a pack cementation technique. A sharp interface was observed between the NbSi2 layer and the pure Nb, while a (Nb5Si3 + T2) two-phase region formed between the NbSi2 layer and the alloy with the T2 phase composition. During oxidation, a glassy SiO2 layer formed significantly increasing the oxidation resistance of the coated alloys. However, evaporation of B occurred forming a porous SiO2 layer during the oxidation of the alloys with high B content. The oxidation behavior of the coated pure Nb and T2 phase alloys is discussed based on a microstructural analysis of the oxidized samples.
Original language | English |
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Pages (from-to) | 103-109 |
Number of pages | 7 |
Journal | International Journal of Refractory Metals and Hard Materials |
Volume | 41 |
DOIs | |
State | Published - Nov 2013 |
Keywords
- High temperature alloy
- Nb alloy
- Oxidation
- Pack cementation
- T2 phase