Performance of integrated silicon infrared microspectrometers

S. H. Kong, G. De Graaf, L. A. Rocha, R. F. Wolffenbuttel

Research output: Contribution to conferencePaperpeer-review

Abstract

The performance of a microspectrometer fabricated in silicon using micromachining techniques is presented. The optical system is composed of two bonded silicon wafers, which have been subjected to microelectronic process compatible micromachining to co-integrate the optical components (an aluminum based grating, an optical path in crystalline silicon and array of poly-silicon thermo-couples) with readout circuits in silicon. Design considerations, fabrication and performance are presented. Measurements confirm an IR operating range between 1 and 9 μm and a half-power spectral resolution of 0.5 μm.

Original languageEnglish
Pages707-710
Number of pages4
StatePublished - 2003
EventProceedings of the 20th IEEE Information and Measurement Technology Conference - Vail, CO, United States
Duration: 20 May 200322 May 2003

Conference

ConferenceProceedings of the 20th IEEE Information and Measurement Technology Conference
Country/TerritoryUnited States
CityVail, CO
Period20/05/0322/05/03

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