Performance of integrated silicon infrared microspectrometers

S. H. Kong; G. De Graaf; L. A. Rocha; R. F. Wolffenbuttel

Performance of integrated silicon infrared microspectrometers

S. H. Kong
, G. De Graaf
, L. A. Rocha
, R. F. Wolffenbuttel

School of Electronics Engineering

Delft University of Technology

Research output: Contribution to conference › Paper › peer-review

Abstract

The performance of a microspectrometer fabricated in silicon using micromachining techniques is presented. The optical system is composed of two bonded silicon wafers, which have been subjected to microelectronic process compatible micromachining to co-integrate the optical components (an aluminum based grating, an optical path in crystalline silicon and array of poly-silicon thermo-couples) with readout circuits in silicon. Design considerations, fabrication and performance are presented. Measurements confirm an IR operating range between 1 and 9 μm and a half-power spectral resolution of 0.5 μm.

Original language	English
Pages	707-710
Number of pages	4
State	Published - 2003
Event	Proceedings of the 20th IEEE Information and Measurement Technology Conference - Vail, CO, United States Duration: 20 May 2003 → 22 May 2003

Conference

Conference	Proceedings of the 20th IEEE Information and Measurement Technology Conference
Country/Territory	United States
City	Vail, CO
Period	20/05/03 → 22/05/03

Cite this

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title = "Performance of integrated silicon infrared microspectrometers",

abstract = "The performance of a microspectrometer fabricated in silicon using micromachining techniques is presented. The optical system is composed of two bonded silicon wafers, which have been subjected to microelectronic process compatible micromachining to co-integrate the optical components (an aluminum based grating, an optical path in crystalline silicon and array of poly-silicon thermo-couples) with readout circuits in silicon. Design considerations, fabrication and performance are presented. Measurements confirm an IR operating range between 1 and 9 μm and a half-power spectral resolution of 0.5 μm.",

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year = "2003",

language = "English",

pages = "707--710",

note = "Proceedings of the 20th IEEE Information and Measurement Technology Conference ; Conference date: 20-05-2003 Through 22-05-2003",

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T1 - Performance of integrated silicon infrared microspectrometers

AU - Kong, S. H.

AU - De Graaf, G.

AU - Rocha, L. A.

AU - Wolffenbuttel, R. F.

PY - 2003

Y1 - 2003

N2 - The performance of a microspectrometer fabricated in silicon using micromachining techniques is presented. The optical system is composed of two bonded silicon wafers, which have been subjected to microelectronic process compatible micromachining to co-integrate the optical components (an aluminum based grating, an optical path in crystalline silicon and array of poly-silicon thermo-couples) with readout circuits in silicon. Design considerations, fabrication and performance are presented. Measurements confirm an IR operating range between 1 and 9 μm and a half-power spectral resolution of 0.5 μm.

AB - The performance of a microspectrometer fabricated in silicon using micromachining techniques is presented. The optical system is composed of two bonded silicon wafers, which have been subjected to microelectronic process compatible micromachining to co-integrate the optical components (an aluminum based grating, an optical path in crystalline silicon and array of poly-silicon thermo-couples) with readout circuits in silicon. Design considerations, fabrication and performance are presented. Measurements confirm an IR operating range between 1 and 9 μm and a half-power spectral resolution of 0.5 μm.

UR - https://www.scopus.com/pages/publications/0037831182

M3 - Paper

AN - SCOPUS:0037831182

SP - 707

EP - 710

T2 - Proceedings of the 20th IEEE Information and Measurement Technology Conference

Y2 - 20 May 2003 through 22 May 2003

ER -

Performance of integrated silicon infrared microspectrometers

Abstract

Conference

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