Perpendicular Magnetic Anisotropy in FePt Patterned Media Employing a CrV Seed Layer

Hyunsu Kim, Jin Seo Noh, Jong Wook Roh, Dong Won Chun, Sungman Kim, Sang Hyun Jung, Ho Kwan Kang, Won Yong Jeong, Wooyoung Lee

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

A thin FePt film was deposited onto a CrV seed layer at 400°C and showed a high coercivity (~3,400 Oe) and high magnetization (900-1,000 emu/cm3) characteristic of L10 phase. However, the magnetic properties of patterned media fabricated from the film stack were degraded due to the Ar-ion bombardment. We employed a deposition-last process, in which FePt film deposited at room temperature underwent lift-off and post-annealing processes, to avoid the exposure of FePt to Ar plasma. A patterned medium with 100-nm nano-columns showed an out-of-plane coercivity fivefold larger than its in-plane counterpart and a remanent magnetization comparable to saturation magnetization in the out-of-plane direction, indicating a high perpendicular anisotropy. These results demonstrate the high perpendicular anisotropy in FePt patterned media using a Cr-based compound seed layer for the first time and suggest that ultra-high-density magnetic recording media can be achieved using this optimized top-down approach.

Original languageEnglish
Article number13
Pages (from-to)1-6
Number of pages6
JournalNanoscale Research Letters
Volume6
Issue number1
DOIs
StatePublished - Jan 2011

Keywords

  • CrV underlayer
  • E-beam lithography
  • FePt
  • Patterned media

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