Abstract
A study was conducted to demonstrate how a photo-insensitive amorphous oxide thin-film transistor was integrated with a plasmonic filter (PF) for transparent electronics. Metal structures at the submicron scale demonstrated a unique optical response known as a surface plasmon (SP). A metallic film with two dimensional nanohole arrays showed high transmission at the SP resonance frequency and the optical response related to this resonance phenomenon could be easily designed by the material and geometrical factors. This structural coloring technology using thin metal films was found to be superior in filtering performance as compared to the conventional dye-based color filter that experienced degradation by heat and light due to the low chemical stability of the organic-dye material.
| Original language | English |
|---|---|
| Pages (from-to) | 3482-3487 |
| Number of pages | 6 |
| Journal | Advanced Functional Materials |
| Volume | 24 |
| Issue number | 23 |
| DOIs | |
| State | Published - 18 Jun 2014 |
Keywords
- amorphous oxides
- negative bias illumination stress
- plasmonic filters
- semiconductors
- transistors
- transparent electronics
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