Photo-Roll Lithography (PRL) for continuous and scalable patterning with application in flexible electronics

Jong G. Ok, Moon Kyu Kwak, Chad M. Huard, Hong Seok Youn, L. Jay Guo

Research output: Contribution to journalArticlepeer-review

83 Scopus citations

Abstract

A novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo-roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask-substrate motions.

Original languageEnglish
Pages (from-to)6554-6561
Number of pages8
JournalAdvanced Materials
Volume25
Issue number45
DOIs
StatePublished - 3 Dec 2013

Keywords

  • flexible electronics
  • graphene
  • light-emitting diodes
  • nanomanufacturing
  • photolithography
  • roll-to-roll processes
  • spectrum filters
  • transparent conductors

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