Abstract
A novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo-roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask-substrate motions.
| Original language | English |
|---|---|
| Pages (from-to) | 6554-6561 |
| Number of pages | 8 |
| Journal | Advanced Materials |
| Volume | 25 |
| Issue number | 45 |
| DOIs | |
| State | Published - 3 Dec 2013 |
Keywords
- flexible electronics
- graphene
- light-emitting diodes
- nanomanufacturing
- photolithography
- roll-to-roll processes
- spectrum filters
- transparent conductors