Photoirradiation and microfiltration of aqueous cleaning solutions for parts

Hak Soon Park, Kwang Ho Choo

Research output: Contribution to journalArticlepeer-review

Abstract

In the machinery industry, cleaning parts is key to the production of high quality mechanical products, requiring the reuse of cleaning solutions over an extended period of time. This study focused on the development and testing of a novel cleaning solution reclamation system composed of several key processes, such as photoirradiation and microfiltration (MF). The removal of organic and particulate matter as well as microbial organisms was evaluated with continuous operation of the novel system. The interactions between prefiltration and photoirradiation were assessed in depth while analyzing the variation in particle removal as well as particle size distribution. It seemed that photoirradiation also affected the characteristics of oil-water emulsions, leading to better gravitational removal of oil. The use of a tight MF membrane enhanced the organic matter removal substantially, indicating that a significant portion of small organic molecules could be rejected by the 30-nm pores. The tight membrane showed a more stable flux profile, due to the smaller dependence of the fouling layer formed on top of the membrane, even though the amount of fouling substances accumulated was nearly the same.

Original languageEnglish
Pages (from-to)271-276
Number of pages6
JournalJournal of Nanoelectronics and Optoelectronics
Volume5
Issue number2
DOIs
StatePublished - Aug 2010

Keywords

  • Energy Saving
  • Nanopore
  • Parts Cleaning
  • Photoirradiation
  • Prefiltration

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