Photolithographic process of microcapsule sheet for electrophoretic display

Lee Soon Park; Hyung Suk Choi; Woo Sik Kim; Dong Ho Lee; Kyung Eun Min; Kwan Ho Seo; Inn Kyu Kang; Soo Young Park; Sung Ho Hwang; Younghwan Kwon

doi:10.1016/j.msec.2003.09.037

Photolithographic process of microcapsule sheet for electrophoretic display

Lee Soon Park, Hyung Suk Choi, Woo Sik Kim, Dong Ho Lee, Kyung Eun Min, Kwan Ho Seo, Inn Kyu Kang, Soo Young Park, Sung Ho Hwang, Younghwan Kwon

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

A new method of fabricating electrophoretic display sheet was developed utilizing a photolithographic process. In this method, stripe-type barrier ribs with height of 50-80 μm and gap between ribs of 100-150 μm were patterned on the transparent electrode substrate by photolithographic process using a negative-type photoresist. Microspheres dispersed in UV curable monomer system were closely packed into the spaces between the barrier ribs. After laminating the upper ITO film, the resulting sheet was UV-irradiated to give an electrophoretic display panel with uniform packing of microspheres.

Original language	English
Pages (from-to)	143-146
Number of pages	4
Journal	Materials Science and Engineering C
Volume	24
Issue number	1-2
DOIs	https://doi.org/10.1016/j.msec.2003.09.037
State	Published - 5 Jan 2004

Keywords

Barrier ribs
Electrophoretic display
Photolithographic process

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10.1016/j.msec.2003.09.037

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title = "Photolithographic process of microcapsule sheet for electrophoretic display",

abstract = "A new method of fabricating electrophoretic display sheet was developed utilizing a photolithographic process. In this method, stripe-type barrier ribs with height of 50-80 μm and gap between ribs of 100-150 μm were patterned on the transparent electrode substrate by photolithographic process using a negative-type photoresist. Microspheres dispersed in UV curable monomer system were closely packed into the spaces between the barrier ribs. After laminating the upper ITO film, the resulting sheet was UV-irradiated to give an electrophoretic display panel with uniform packing of microspheres.",

keywords = "Barrier ribs, Electrophoretic display, Photolithographic process",

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doi = "10.1016/j.msec.2003.09.037",

language = "English",

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T1 - Photolithographic process of microcapsule sheet for electrophoretic display

AU - Park, Lee Soon

AU - Choi, Hyung Suk

AU - Kim, Woo Sik

AU - Lee, Dong Ho

AU - Min, Kyung Eun

AU - Seo, Kwan Ho

AU - Kang, Inn Kyu

AU - Park, Soo Young

AU - Hwang, Sung Ho

AU - Kwon, Younghwan

PY - 2004/1/5

Y1 - 2004/1/5

N2 - A new method of fabricating electrophoretic display sheet was developed utilizing a photolithographic process. In this method, stripe-type barrier ribs with height of 50-80 μm and gap between ribs of 100-150 μm were patterned on the transparent electrode substrate by photolithographic process using a negative-type photoresist. Microspheres dispersed in UV curable monomer system were closely packed into the spaces between the barrier ribs. After laminating the upper ITO film, the resulting sheet was UV-irradiated to give an electrophoretic display panel with uniform packing of microspheres.

AB - A new method of fabricating electrophoretic display sheet was developed utilizing a photolithographic process. In this method, stripe-type barrier ribs with height of 50-80 μm and gap between ribs of 100-150 μm were patterned on the transparent electrode substrate by photolithographic process using a negative-type photoresist. Microspheres dispersed in UV curable monomer system were closely packed into the spaces between the barrier ribs. After laminating the upper ITO film, the resulting sheet was UV-irradiated to give an electrophoretic display panel with uniform packing of microspheres.

KW - Barrier ribs

KW - Electrophoretic display

KW - Photolithographic process

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DO - 10.1016/j.msec.2003.09.037

M3 - Article

AN - SCOPUS:0348107310

SN - 0928-4931

VL - 24

SP - 143

EP - 146

JO - Materials Science and Engineering C

JF - Materials Science and Engineering C

IS - 1-2

ER -

Photolithographic process of microcapsule sheet for electrophoretic display

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Keywords

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