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Photolithographic process of microcapsule sheet for electrophoretic display

  • Lee Soon Park
  • , Hyung Suk Choi
  • , Woo Sik Kim
  • , Dong Ho Lee
  • , Kyung Eun Min
  • , Kwan Ho Seo
  • , Inn Kyu Kang
  • , Soo Young Park
  • , Sung Ho Hwang
  • , Younghwan Kwon
  • Kyungpook National University
  • Department of Chemistry
  • Daegu University

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

A new method of fabricating electrophoretic display sheet was developed utilizing a photolithographic process. In this method, stripe-type barrier ribs with height of 50-80 μm and gap between ribs of 100-150 μm were patterned on the transparent electrode substrate by photolithographic process using a negative-type photoresist. Microspheres dispersed in UV curable monomer system were closely packed into the spaces between the barrier ribs. After laminating the upper ITO film, the resulting sheet was UV-irradiated to give an electrophoretic display panel with uniform packing of microspheres.

Original languageEnglish
Pages (from-to)143-146
Number of pages4
JournalMaterials Science and Engineering C
Volume24
Issue number1-2
DOIs
StatePublished - 5 Jan 2004

Keywords

  • Barrier ribs
  • Electrophoretic display
  • Photolithographic process

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