Plasmonic color filters for large area display devices fabricated by laser interference lithography

  • Yun Seon Do
  • , Jung Ho Park
  • , Bo Yeon Hwang
  • , Sung Min Lee
  • , Byeong Kwon Ju
  • , Kyung Cheol Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm x 2.5 cm.

Original languageEnglish
Title of host publication2012 Conference on Lasers and Electro-Optics, CLEO 2012
StatePublished - 2012
Event2012 Conference on Lasers and Electro-Optics, CLEO 2012 - San Jose, CA, United States
Duration: 6 May 201211 May 2012

Publication series

Name2012 Conference on Lasers and Electro-Optics, CLEO 2012

Conference

Conference2012 Conference on Lasers and Electro-Optics, CLEO 2012
Country/TerritoryUnited States
CitySan Jose, CA
Period6/05/1211/05/12

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