Plasmonic roller lithography

Photo roller lithography systems can generate patterns continuously over large areas by employing flexible photomasks on rotating quartz cylinders. In comparison, plasmonic lithography systems can reach deep sub-wavelength resolution utilizing evanescent waves carrying high spatial frequency components. In this work, we demonstrate a plasmonic roller system by integrating a quartz mechanical roller with a specially designed photomask based on plasmonic waveguide lithography. Deep sub-wavelength uniform patterns with high aspect ratios were printed continuously over a moving substrate. The plasmonic roller system may find practical applications in the large-scale production of electronic and photonic devices in a cost-effective way.