Post-deposition annealing effects on the transparent conducting properties of anatase Nb:TiO₂ films on glass substrates

Engineering

• Annealing Temperature 100%
• Glass Substrate 100%
• Annealing Effect 100%
• Temperature Dependence 50%
• Ray Diffraction 50%
• Room Temperature 50%
• Pulsed Laser 50%
• Energy Gap 50%
• Torr 50%
• Carrier Density 50%

Material Science

• Film 100%
• Titanium Dioxide 100%
• Annealing 50%
• Amorphous Material 25%
• Pulsed Laser Deposition 25%
• Electrical Resistivity 25%
• Carrier Concentration 25%
• X-Ray Diffraction 25%
• Hall Mobility 25%