Abstract
Water-soluble terpolymer of acrylamide, diacetone acrylamide, and acrylic acid was prepared by redox initiators in aqueous medium. One component photoresist was synthesized by reaction of terpolymer with 4-azidoaniline. By blending the aqueous acrylamide/diacetone acrylamide copolymer solution with bisazide, 4,4′-diazidostilbene-2,2′-disulfuric acid sodium salt, two component photoresist was prepared. The photosensitivity per azido group unit mole of one component photoresist was 4 times higher than that of two component photoresist. The dot-type pattern was successfully achieved with one component photoresist at low exposure energy, which is prospective to be used as black matrix negative photoresist.
| Original language | English |
|---|---|
| Pages (from-to) | 374-378 |
| Number of pages | 5 |
| Journal | Polymer (Korea) |
| Volume | 31 |
| Issue number | 5 |
| State | Published - Sep 2007 |
Keywords
- Azido group
- Black matrix
- Negative photoresist
- Photosensitivity
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