Preparation of K₃LI₂NB₅O₁₅ (KLM) thin films by RF-magnetron sputter process

In this study, the KLN thin films were prepared by RF-magnetron sputtering method onto Corning 1737 glass. The effect of working pressure, substrate temperature, RF-power, sputter gas ratio (Ar/O₂) during deposition was investigated. For an optimum deposition condition, the post-annealing, RTA(rapid thermal annealing) and IPA(in-situ post annealing)methods were employed. Both RTA and IPA processes, which were conducted at different deposition and annealing temperature influenced surface morphology and optical properties of the films. The films prepared by the IPA process showed a lower crystallization temperature and better optical transmittance.