Preparation of K₃LI₂NB₅O₁₅ (KLM) thin films by RF-magnetron sputter process

Engineering

• Thin Films 100%
• Annealing Process 100%
• Magnetron 100%
• Rapid Thermal Annealing 100%
• Annealing Temperature 50%
• Crystallization Temperature 50%
• Surface Morphology 50%
• Deposition Temperature 50%
• Substrate Temperature 50%
• Deposition Condition 50%

Material Science

• Thin Films 100%
• Annealing 100%
• Film 33%
• Optical Property 16%
• Surface Morphology 16%
• Magnetron Sputtering 16%

Chemical Engineering

• Magnetron Sputtering 100%