Process to form V-grooved trenches on patterned Si (001) substrates using in situ selective area etching in a MOCVD reactor

Young Dae Cho, In Geun Lee, Joo Hee Lee, Sun Wook Kim, Chan Soo Shin, Won Kyu Park, Chung Yi Kim, Dae Hyun Kim, Dae Hong Ko

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

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