Process variation-tolerant 3D microprocessor design: An efficient architectural solution

Joonho Kong, Sung Woo Chung

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Process variation is one of the most challenging problems for 3D microprocessors. This is because stacked dies are likely to have fairly different characteristics due to wafer-to-wafer (W2W) variations, which may severely hurt yield of 3D microprocessors. In this paper, we introduce a process variation-tolerant 3D microprocessor design that exploits an architectural insight: narrow-width values. The main target of our technique is last-level caches (LLCs), which are composed of several dies. By storing only the meaningful bit parts within a data word into the LLCs while discarding the zero bit parts (which can be recovered by the zero-extension logic), our proposed technique improves a storage efficiency of the LLCs, which eventually enhances cache yield. According to our evaluation results, our technique significantly improves cache yield in a performance-/energy-efficient manner.

Original languageEnglish
Title of host publicationICICDT 2013 - International Conference on IC Design and Technology, Proceedings
Pages45-48
Number of pages4
DOIs
StatePublished - 2013
Event2013 International Conference on IC Design and Technology, ICICDT 2013 - Pavia, Italy
Duration: 29 May 201331 May 2013

Publication series

NameICICDT 2013 - International Conference on IC Design and Technology, Proceedings

Conference

Conference2013 International Conference on IC Design and Technology, ICICDT 2013
Country/TerritoryItaly
CityPavia
Period29/05/1331/05/13

Keywords

  • 3D microprocessor
  • last-level cache
  • narrowwidth value
  • process variation
  • yield

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