Proton implantation effects on electrical and recombination properties of undoped ZnO

A. Y. Polyakov, N. B. Smirnov, A. V. Govorkov, E. A. Kozhukhova, V. I. Vdovin, K. Ip, M. E. Overberg, Y. W. Heo, D. P. Norton, S. J. Pearton, J. M. Zavada, V. A. Dravin

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Abstract

The proton implantation effects on electrical and recombination properties of undoped ZnO were studied. Photoluminescence (PL) spectra measurements showed a very strong decrease in PL intensity in all bands after heavy implantation with 100 keV protons. Three deep electron traps with apparent activation energies of 0.55, 0.75 and 0.9 eV were introduced by proton implantation.

Original languageEnglish
Pages (from-to)2895-2900
Number of pages6
JournalJournal of Applied Physics
Volume94
Issue number5
DOIs
StatePublished - 1 Sep 2003

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