Abstract
Nb-doped TiO2 (Nb:TiO2) films were grown on a hexagonal (0001)Al2O3 substrate at 650 C and ∼10 -5 Torr. The Nb:TiO2 film had a small resistivity of ∼8×10-4 Ω cm at room temperature and a behavior of a slightly increasing resistance upon cooling. In addition, the Nb:TiO2 film had an optical transmittance of about 60% in the visible range. A careful analysis of the in-plane atomic structure suggests that the rutile Nb:TiO 2 film on the hexagonal (0001)Al2O3 can be re-interpreted by a certain pseudo-hexagonal structure, which is discriminated from the in-plane rectangular one of the tetragonal (100)Nb:TiO2. The pseudo-hexagonal properties of the Nb:TiO2 film were characterized by negligible mosaic structure at the interface, the same electron diffraction pattern as the hexagonal Al2O3 substrate, and perfect six-fold symmetries in the pole figure and φ-scan XRD patterns.
Original language | English |
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Pages (from-to) | 118-122 |
Number of pages | 5 |
Journal | Journal of Crystal Growth |
Volume | 380 |
DOIs | |
State | Published - 2013 |
Keywords
- A3. Characterization
- A3. Laser epitaxy
- B1 Oxides
- B1. Semiconducting materials