Rapid Thermal Processing with Real-Time Measurement Using Type-K Thermocouple

High-temperature thermal treatments are necessary to improve the structural stability of sensor and chemical reactivity between a detecting gas and a sensor. These processes require accurate ratios between the gas-sensing materials and the metal-catalyst materials, after the high-temperature vacuum thermal treatment, to improve electrical stability, reproducibility, and reliability. Therefore, exact temperature control is necessary in the process. In this study, direct–indirect methods of real-time measurement and control of substrate temperature were developed to resolve the issues that arise when using either method (direct or indirect) alone. Using this method, it is possible to measure the exact substrate temperature Delivered by^of Ingenta^the semiconductor to: Elsevier gasBV sensor. If the temperature of the substrate is not controlled IP: 203.56.241.128 during rapid thermal On:processing Sat, 12 Aug (RTP), 2017 the11:39:36 evaporation of nanostructures can occur.