Abstract
This paper presents a radio-frequency (RF) model and extracted model parameters for junctionless silicon nanowire (JLSNW) metaloxidesemiconductor field-effect transistors (MOSFETs) using a 3-D device simulator. JLSNW MOSFETs are evaluated for various RF parameters such as cutoff frequency fT, gate input capacitance, distributed channel resistances, transport time delay, and capacitance by the drain-induced barrier lowering effect. Direct comparisons of high-frequency performances and extracted parameters are made with conventional silicon nanowire MOSFETs. A non-quasi-static RF model has been used, along with SPICE to simulate JLSNW MOSFETs with RF parameters extracted from 3-D-simulated Y-parameters. The results show excellent agreements with the 3-D-simulated results up to the high frequency of fT.
Original language | English |
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Article number | 5720296 |
Pages (from-to) | 1388-1396 |
Number of pages | 9 |
Journal | IEEE Transactions on Electron Devices |
Volume | 58 |
Issue number | 5 |
DOIs | |
State | Published - May 2011 |
Keywords
- Device simulation
- junctionless (JL)
- metaloxidesemiconductor field-effect transistor (MOSFET)
- modeling
- non-quasi-static (NQS)
- parameter extraction
- radio frequency (RF)
- silicon nanowire (SNW)