@inproceedings{1d49e341fdb84998be5c100aa7e5cb9f,
title = "Rolling mask nanolithography: The pathway to large area and low cost nanofabrication",
abstract = "The demand for large area and low cost nanopatterning techniques for optical coatings and photonic devices has increased at a tremendous rate. At present, it is clear that currently available nanopatterning technologies are unable to meet the required performance, fabrication-speed, or cost criteria for many applications requiring large area and low cost nanopatterning. Rolith Inc proposes to use a new nanolithography method - {"}Rolling mask{"} lithography - that combines the best features of photolithography, soft lithography and roll-to-plate printing technologies. We will report on the first results achieved on a recently built prototype tool and cylindrical mask, which was designed to pattern 300 mm wide substrate areas.",
keywords = "Cylindrical mask, Nanolithography, Nanopatterning, Nanostructured coatings, Near-field optical lithography, Phase mask, Plasmonic mask, Sot lithography",
author = "Boris Kobrin and Barnard, {Edward S.} and Brongersma, {Mark L.} and Kwak, {Moon Kyu} and Guo, {L. Jay}",
year = "2012",
doi = "10.1117/12.910158",
language = "English",
isbn = "9780819488923",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V",
note = "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V ; Conference date: 24-01-2012 Through 25-01-2012",
}