Selective sintering of metal nanoparticle ink for maskless fabrication of an electrode micropattern using a spatially modulated laser beam by a digital micromirror device

Kunsik An; Sukjoon Hong; Seungyong Han; Hyungman Lee; Junyeob Yeo; Seung Hwan Ko

doi:10.1021/am405323c

Selective sintering of metal nanoparticle ink for maskless fabrication of an electrode micropattern using a spatially modulated laser beam by a digital micromirror device

Kunsik An, Sukjoon Hong, Seungyong Han, Hyungman Lee, Junyeob Yeo, Seung Hwan Ko

Research output: Contribution to journal › Article › peer-review

67 Scopus citations

Abstract

We demonstrate selective laser sintering of silver (Ag) nanoparticle (NP) ink using a digital micromirror device (DMD) for the facile fabrication of 2D electrode pattern without any conventional lithographic means or scanning procedure. An arbitrary 2D pattern at the lateral size of 25 μm × 25 μm with 160 nm height is readily produced on a glass substrate by a short exposure of 532 nm Nd:YAG continuous wave laser. The resultant metal pattern exhibits low electrical resistivity of 10.8 uΩ·cm and also shows a fine edge sharpness by the virtue of low thermal conductivity of Ag NP ink. Furthermore, 10 × 10 star-shaped micropattern arrays are fabricated through a step-and-repeat scheme to ensure the potential of this process for the large-area metal pattern fabrication.

Original language	English
Pages (from-to)	2786-2790
Number of pages	5
Journal	ACS applied materials & interfaces
Volume	6
Issue number	4
DOIs	https://doi.org/10.1021/am405323c
State	Published - 26 Feb 2014

Keywords

digital micromirror device
low temperature metal thin film patterning
nanoparticle ink
nanoparticle laser sintering
nonvacuum environment

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10.1021/am405323c

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title = "Selective sintering of metal nanoparticle ink for maskless fabrication of an electrode micropattern using a spatially modulated laser beam by a digital micromirror device",

abstract = "We demonstrate selective laser sintering of silver (Ag) nanoparticle (NP) ink using a digital micromirror device (DMD) for the facile fabrication of 2D electrode pattern without any conventional lithographic means or scanning procedure. An arbitrary 2D pattern at the lateral size of 25 μm × 25 μm with 160 nm height is readily produced on a glass substrate by a short exposure of 532 nm Nd:YAG continuous wave laser. The resultant metal pattern exhibits low electrical resistivity of 10.8 uΩ·cm and also shows a fine edge sharpness by the virtue of low thermal conductivity of Ag NP ink. Furthermore, 10 × 10 star-shaped micropattern arrays are fabricated through a step-and-repeat scheme to ensure the potential of this process for the large-area metal pattern fabrication.",

keywords = "digital micromirror device, low temperature metal thin film patterning, nanoparticle ink, nanoparticle laser sintering, nonvacuum environment",

author = "Kunsik An and Sukjoon Hong and Seungyong Han and Hyungman Lee and Junyeob Yeo and Ko, {Seung Hwan}",

year = "2014",

month = feb,

day = "26",

doi = "10.1021/am405323c",

language = "English",

volume = "6",

pages = "2786--2790",

journal = "ACS applied materials & interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

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Selective sintering of metal nanoparticle ink for maskless fabrication of an electrode micropattern using a spatially modulated laser beam by a digital micromirror device. / An, Kunsik; Hong, Sukjoon; Han, Seungyong et al.
In: ACS applied materials & interfaces, Vol. 6, No. 4, 26.02.2014, p. 2786-2790.

Research output: Contribution to journal › Article › peer-review

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T1 - Selective sintering of metal nanoparticle ink for maskless fabrication of an electrode micropattern using a spatially modulated laser beam by a digital micromirror device

AU - An, Kunsik

AU - Hong, Sukjoon

AU - Han, Seungyong

AU - Lee, Hyungman

AU - Yeo, Junyeob

AU - Ko, Seung Hwan

PY - 2014/2/26

Y1 - 2014/2/26

N2 - We demonstrate selective laser sintering of silver (Ag) nanoparticle (NP) ink using a digital micromirror device (DMD) for the facile fabrication of 2D electrode pattern without any conventional lithographic means or scanning procedure. An arbitrary 2D pattern at the lateral size of 25 μm × 25 μm with 160 nm height is readily produced on a glass substrate by a short exposure of 532 nm Nd:YAG continuous wave laser. The resultant metal pattern exhibits low electrical resistivity of 10.8 uΩ·cm and also shows a fine edge sharpness by the virtue of low thermal conductivity of Ag NP ink. Furthermore, 10 × 10 star-shaped micropattern arrays are fabricated through a step-and-repeat scheme to ensure the potential of this process for the large-area metal pattern fabrication.

AB - We demonstrate selective laser sintering of silver (Ag) nanoparticle (NP) ink using a digital micromirror device (DMD) for the facile fabrication of 2D electrode pattern without any conventional lithographic means or scanning procedure. An arbitrary 2D pattern at the lateral size of 25 μm × 25 μm with 160 nm height is readily produced on a glass substrate by a short exposure of 532 nm Nd:YAG continuous wave laser. The resultant metal pattern exhibits low electrical resistivity of 10.8 uΩ·cm and also shows a fine edge sharpness by the virtue of low thermal conductivity of Ag NP ink. Furthermore, 10 × 10 star-shaped micropattern arrays are fabricated through a step-and-repeat scheme to ensure the potential of this process for the large-area metal pattern fabrication.

KW - digital micromirror device

KW - low temperature metal thin film patterning

KW - nanoparticle ink

KW - nanoparticle laser sintering

KW - nonvacuum environment

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Selective sintering of metal nanoparticle ink for maskless fabrication of an electrode micropattern using a spatially modulated laser beam by a digital micromirror device

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