Abstract
We investigated the photosensitivity of indium zinc oxide (IZO) stripe structures that had different widths from 50 nm to 4 μm and the same thickness of 50 nm deposited by RF magnetron sputtering. The distance of two Ti/Au Ohmic electrodes along the IZO stripes was kept constant at 25 μm. In the dark and under 365/254 nm UV illumination, the photosensitivity was measured in air. A very slow decay of the photoresponse was observed-a typical signature of surface states. Above the critical size of 80 nm, the photosensitivities of the indium zinc oxides were less than 1%. By sharp contrast, as the size of the indium zinc oxide stripes decreased from 80 nm to 50 nm, the photosensitivity of the indium zinc oxides increased from 1% to 16%. A significant increase of the photosensitivity at the size below a critical value of 80 nm was observed, which could be explained by the high surface-to-volume ratio and surface charge trapping effects.
| Original language | English |
|---|---|
| Pages (from-to) | 143-146 |
| Number of pages | 4 |
| Journal | Journal of Nanoelectronics and Optoelectronics |
| Volume | 5 |
| Issue number | 2 |
| DOIs | |
| State | Published - Aug 2010 |
Keywords
- Indium Zinc Oxide
- Photosensitivity
- UV Illumination
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