Solution-processed low leakage organic field-effect transistors with self-pattern registration based on patterned dielectric barrier

We demonstrated a new type of a solution-processed organic field-effect transistor (OFET) in a bottom-gate, top-contact geometry where low leakage current and self-pattern registration were achieved using a patterned dielectric barrier (PDB). The PDB of a hydrophobic fluorinated-polymer was produced on the top of a polymeric gate insulator of poly(4-vinylphenyl) by transfer-printing. The PDB enables to effectively screen out the vertical charge flow generated from the gate electrode, and thus the vertical leakage current between the gate and the drain was reduced by two orders of the magnitude compared to the leakage current in a conventional OFET without the PDB. Moreover, the PDB defines spontaneously an active channel pattern from a solution of 6,13- bis(triisopropylsilylethynyl) pentacene (TIPS PEN) by means of the selective wettability and the geometrical confinement.