Sputtering yield and secondary electron emission coefficient (γ) of the MgO, MgAl2O4 and MgAl2O4/MgO thin film grown on the Cu substrate by using the Focused Ion Beam

Kang Won Jung, H. J. Lee, W. H. Jeong, H. J. Oh, E. H. Choi, Y. H. Seo, S. O. Kang, C. W. Park

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