Study on the Temperature Dependence of Three-dimensional Graphene Structure by Thermal Chemical Vapor Deposition

The effect of temperature on the synthesis of porous three-dimensional (3D) graphene structures on a foam Ni structure by using thermal chemical vapor deposition (TCVD) was investigated. The porous 3D graphene structure was fabricated by forming multi-layered graphene on the surface of a foam Ni structure as the base frame. The foam Ni structure was synthesized using TCVD at temperatures of 800, 900, 1000, and 1100 °C. After graphene synthesis, the Ni substrates were removed using a chemical etching method. The fabricated 3D graphene structure formed a low-density porous network in which multilayered graphene is connected to each other and has pores of various sizes, as confirmed through various analyses. In addition, it was confirmed that the fabricated 3D graphene structure at a synthesis temperature of 1100 °C was deformed without following the shape of the existing Ni structure.