Abstract
We present a new semi-insulating carbon-doped GaN/undoped GaN multi-layered buffer structure for AlGaN/GaN heterojunction field effect transistors, which drastically suppresses current collapse in GaN MISHFET with improving the on-current performance of the device but without degrading the breakdown characteristic. It is believed that spatial compensation between the multi-layered GaN layers not only makes the multi-layered buffer layer very highly resistive, but also prevents the electrons from the 2DEG channel from being captured into deep traps in the buffer layer, which maintains high-high breakdown characteristic and leads to great suppression of current collapse in AlGaN/GaN-based transistors, respectively.
| Original language | English |
|---|---|
| Pages (from-to) | 1116-1121 |
| Number of pages | 6 |
| Journal | Physica Status Solidi (A) Applications and Materials Science |
| Volume | 212 |
| Issue number | 5 |
| DOIs | |
| State | Published - 1 May 2015 |
Keywords
- AlGaN
- current collapse
- doping
- GaN
- heterostructure field-effect transistors
- MOCVD
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