Abstract
The high reactivity of N2H4 on Si surface turned out to be due to the additional nucleophilic/basic nitrogen, which reduce activation barriers of subsequent surface reactions. It was illustrated that better understanding of the complex surface reactions requires not only the initial surface reactions but also various subsequent surface reactions. It was shown that the overall surface reactivity can be controlled by introducing additional nucleophilic/basic substituents.
Original language | English |
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Pages (from-to) | 979-987 |
Number of pages | 9 |
Journal | Journal of Chemical Physics |
Volume | 120 |
Issue number | 2 |
DOIs | |
State | Published - 8 Jan 2004 |